Using N-Heterocyclic Olefins (NHOs) and Frustrated Lewis Pairs (FLP) to Promote Small Molecule Activation and Nanomaterial Deposition in the Main Group


This presentation will describe our recent application of Frustrated Lewis Pairs (FLPs) to gain access to inorganic methylene EH2 complexes (E = Group 14 element) and their use to deposit bulk metal films from solution.[1] This will be followed by a highlight of our studies on anionic N-heterocyclic olefin (NHO) ligands, leading to rare examples of acyclic two-coordinate silylenes (R2Si:). I will also describe the ability of our silylenes to activate strong homo- and heteroatomic bonds under mild conditions.[2]

[1] For reviews of EH2 complexes, see: E. Rivard, Chem. Soc. Rev. 2016, 45, 989-1003.

[2] a) M. M. D. Roy, E. Rivard, Acc. Chem. Res. 2017, 50, 2017-2025; b) C. Hering-Junghans, P. Andreiuk, M. J. Ferguson, R. McDonald, E. Rivard, Angew. Chem., Int. Ed. 2017, 56, 6272-6275; c) M. M. D. Roy, M. J. Ferguson, R. McDonald, Y. Zhou, E. Rivard, Chem. Sci. 2019, 10, 6476-6481.


1:00 PM | GILMER HALL 130
Wednesday, February 19, 2020
Dr. Eric Rivard
University of Alberta
Professor Robert Gilliard