Using N-Heterocyclic Olefins (NHOs) and Frustrated Lewis Pairs (FLP) to Promote Small Molecule Activation and Nanomaterial Deposition in the Main Group

ABSTRACT

This presentation will describe our recent application of Frustrated Lewis Pairs (FLPs) to gain access to inorganic methylene EH2 complexes (E = Group 14 element) and their use to deposit bulk metal films from solution.[1] This will be followed by a highlight of our studies on anionic N-heterocyclic olefin (NHO) ligands, leading to rare examples of acyclic two-coordinate silylenes (R2Si:). I will also describe the ability of our silylenes to activate strong homo- and heteroatomic bonds under mild conditions.[2]

[1] For reviews of EH2 complexes, see: E. Rivard, Chem. Soc. Rev. 2016, 45, 989-1003.

[2] a) M. M. D. Roy, E. Rivard, Acc. Chem. Res. 2017, 50, 2017-2025; b) C. Hering-Junghans, P. Andreiuk, M. J. Ferguson, R. McDonald, E. Rivard, Angew. Chem., Int. Ed. 2017, 56, 6272-6275; c) M. M. D. Roy, M. J. Ferguson, R. McDonald, Y. Zhou, E. Rivard, Chem. Sci. 2019, 10, 6476-6481.

               

Time and Location: 
1:00 PM | GILMER HALL 130
Academic Year: 
2020
Event Date: 
Wednesday, February 19, 2020
Semester: 
Speaker: 
Dr. Eric Rivard
Speaker Title: 
University of Alberta
Host: 
Professor Robert Gilliard